Beijing Yuji Science and Technology Co., Ltd.

Beijing Yuji Science and Technology Co., Ltd. Beijing Yuji Science & Technology Co., Ltd. (Yuji Tech) specializes in R&D and production of fluorinated chemicals, LED phosphors and LED Emitters.

In fluorine chemical, we have been dedicated in R&D and production of ODS alternatives for years. With the goal of contributing to the sustainable development of society, we hold integrity, innovation, people-oriented work ethic as our corporate philosophies, and work to develop an energy and resource-saving, as well as an environmentally friendly enterprise. By taking advantage of the trend and t

he materials, Yuji Tech strives to become a world leader in the world of science and technology. Further information at http://www.beijingyuji.com/

29/06/2021

The application of HFO-1336mzz(E) as Working Fluid
As working fluid, HFO-1336mzz(E) is a viable solution enabling both High Temperature Heat Pump (HTHP) and Organic Rankine Cycle (ORC) technology platforms to recover heat from various sources and reduce fossil fuel dependencies. HFO-1336mzz(E) allowed for higher condensing temperatures and higher COPH than HFC-134a, HFO-1234yf and HFO-1234ze(E), which helps the economic justification for their use in heat pump applications, several potential ones are low pressure steam generation, high temperature drying, sterilization, process heating and food manufacturing industry. HFO-1336mzz(E) can replace CFC-114 and HFC-236fa in the coolers, including flooded evaporator or direct expansion evaporator, used centrifugal or screw compressor. And HFO-1336mzz(E) may provide the required parameters (mean reasonably good energy efficiency and cooling capacity) and be compatible with various kinds of lubricant.

29/06/2021

The application of HFO-1336mzz(E) as Insulating Gas
SF6 has been the main insulating gas used in electrical system and devices for several decades. However, people have found that SF6 is one of the most serious greenhouse gases known to mankind at present, and has a long lifetime for thousand years. It is too stable to decompose in the atmosphere, which greatly exacerbates the possibility of global warming. SF6 has been currently included in the list of gases that should be restricted to the atmosphere by Kyoto Protocol. It is demonstrated that HFO-1336mzz(E), as an environmentally friendly gas, has higher dielectric strength and much lower GWP than SF6 and can be used as an electrically insulating and/or arc-extinguishing gaseous medium by the patent published by Siemens. HFO-1336mzz(E) has six fluorine atoms, attached to the terminal methyl groups and can accordingly initiate gas discharges which form a precursor (F- ion) to prevent dielectric breakdown by dissociative attachment. Meanwhile, HFO-1336mzz(E) has shorter lifetime and lower toxicity than other novel insulation gas [mainly mean perfluoro-compound, including fluorinated ketone(s) and fluorinated nitrile(s)].

29/06/2021

CF3I as trifluoromethyl radical source for the synthesis of the drugs intermediates
Trifluoromethyl substituent is one of the most frequently used groups in the drug development. The CF3 group helps to improve metabolic stability of the drugs due to the high C–F bond strength and due to its increased oxidative stability. The CF3 moiety often shows relatively increased binding selectivity at the enzyme active site and is frequently buried in the hydrophobic pocket of the enzymes. As it is relatively highly lipophilic, the trifluoromethylated compounds are generally permeable through the cell membranes, and thus trifluoromethylated compounds have improved bioavailability. A majority of the trifluoromethylcontaining pharmaceuticals have the CF3 moiety incorporated into the aryl rings, while some others contain a trifluoromethyl ketone pharmacophore.[1] Trifluoromethylated aromatic, hetero-aromatic and pseudoaromatic compounds are also important intermediates for synthesis of pharmaceuticals.
Efficient transfer of the trifluoromethyl group from a reagent to a target molecule is key for the reaction, and the reagents are classified according to their radical, nucleophilic or electrophilic character. Direct trifluoromethylation is simple and therefore promising as an industrial process. A trifluoromethyl radical is widely used in direct trifluoromethylation. Radical trifluoromethylation can be achieved from various sources of trifluoromethyl radicals that include trifluoromethyl iodide, trifluoromethylacetyl and trifluoromethylsulfonyl derivatives, S-trifluoromethyl xanthates and others[2]. CF3I, which is one of the available radical sources of a trifluoromethyl radical, was also utilized for radical trifluoromethylation.
[1] Organofluorine Compounds in Biology and Medicine. http://dx.doi.org/10.1016/B978-0-444-53748-5.00003-4.
[2] Ma, J.-A.; Cahard, D. J. Fluorine Chem. 2007, 128, 975–996. doi:10.1016/j.jfluchem.2007.04.026.

29/06/2021

The applications of HFO-1336mzz-E
1,1,1,4,4,4-hexafluoro-2-butene has an ozone depletion potential of zero and low global warming potential (GWP). It exists as two different stereo isomers, cis-1,1,1,4,4,4-hexafluoro-2-butene (HFO-133mzz-Z) and trans-1,1,1,4,4,4-hexafluoro-2-butene (HFO-133mzz-E), which have different boiling points and possibly perform differently in different applications. HFO-1336mzz(E) has a GWP of 18, a boiling point of 7.5℃ and a critical temperature of 137.7 ℃. It has a favorable toxicity and shown good compatibility with many plastics and elastomers commonly encountered in equipment presently. Trans-1,1,1,4,4,4-hexafluoro-2-butene (HFO-133mzz-E) is a novel, non-flammable, odorless gas that finds uses as a foam transfer agent, heat transfer working fluid, and specialty gas.

29/06/2021

Applications of high purity C3F6 in semiconductor process
In semiconductor dry etching processes, octafluorocyclobutane (c-C4F8) is widely used as an etching gas instead of conventional CF4, because the relatively high C/F ratio of C4F8 is believed to induce the formation of a C:F film on Si or SiN, which acts as an etching barrier, thus improving the selectivity. However, c-C4F8 is a PFC with a very high global-warming potential (GWP). So Shin team from Association of Super-advanced Electronics Technologies in Japan has investigated perfluoro-2-butene (l-C4F8) and Hexafluoropropylene (l-C3F6) as an alternative. Their results show that the oxide etching characteristics of linear chain gases will be more useful than of c-C4F8 as device structures become smaller. The results also show that the relatively high C/F ratio of C3F6 can induce the formation of a C:F film on Si or SiN, which acts as an etching barrier, thus improving the selectivity.

29/06/2021

YUJI Tech Present at SEMICON CHINA 2021 with Fluorine-containing Electronic Gases
SEMICON CHINA 2021 was held in Shanghai New International Exhibition Centre (SNIEC) on March 17th - 19th, 2021. Yuji Tech with Hexafluoro-1,3-butadiene (C4F6), Methyl Fluoride (CH3F), Methyl Fluoride (CF3I) and other fluorine-containing electronic gases present at SEMICON CHINA for the first time, attracting wide attention in the industry.
Yuji Tech has the leading production and purification process in the electronic gases industry. From raw materials to finished products, we have undergone strict quality control, so as to guarantee to provide customers with stable and high quality electronic gases.
In the Industrialization of electronic gases, from raw material production to purification, Yuji Tech has established a new mode of product industrialization: Bench Scal Technology Development -- Pilot scal Technology Development -- Industrialization -- Marketing and Application.
The main electronic gases of Yuji tech include C4F6、CF3I、CH3F、CH2F2、CHF3、236ea、236fa、1234ze-E、1336mzz-E、C2HF5、C2F6、C3F6、C3F8、c-C4F8、C4F7N. Among these electronic gases, C4F6、CF3I、CH3F、C4F7N are in the leading position in the electronic gases industry.

Beijing Yuji Technology & Technology Co., Ltd. offers the new generation fluorine electronic special gas C4F6 (Hexafluor...
28/12/2020

Beijing Yuji Technology & Technology Co., Ltd. offers the new generation fluorine electronic special gas C4F6 (Hexafluoro-1,3-butadiene, HFBD). After many years of research and development, Beijing Yuji has designed the production line of C4F6, and has gone into mass production successfully.

03/03/2020

Trifluoromethyl substituent is one of the most frequently used groups in the drug development. The CF3 group helps to improve metabolic stability of the drugs due to the high C–F bond strength and due to its increased oxidative stability. The CF3 moiety often shows relatively increased binding selectivity at the enzyme active site and is frequently buried in the hydrophobic pocket of the enzymes. As it is relatively highly lipophilic, the trifluoromethylated compounds are generally permeable through the cell membranes, and thus trifluoromethylated compounds have improved bioavailability. A majority of the trifluoromethylcontaining pharmaceuticals have the CF3 moiety incorporated into the aryl rings, while some others contain a trifluoromethyl ketone pharmacophore.[1] Trifluoromethylated aromatic, hetero-aromatic and pseudoaromatic compounds are also important intermediates for synthesis of pharmaceuticals.
Efficient transfer of the trifluoromethyl group from a reagent to a target molecule is key for the reaction, and the reagents are classified according to their radical, nucleophilic or electrophilic character. Direct trifluoromethylation is simple and therefore promising as an industrial process. A trifluoromethyl radical is widely used in direct trifluoromethylation. Radical trifluoromethylation can be achieved from various sources of trifluoromethyl radicals that include trifluoromethyl iodide, trifluoromethylacetyl and trifluoromethylsulfonyl derivatives, S-trifluoromethyl xanthates and others[2]. CF3I, which is one of the available radical sources of a trifluoromethyl radical, was also utilized for radical trifluoromethylation.

05/02/2020

Electronic Speciality Gas——CF3I
Beijing Yuji successfully developed a synthesizing process to produce iodotrifluoromethane(CF3I). Meantime, Beijing Yuji has purified iodotrifluoromethane, whose purity can achieve 99.99%.
Iodotrifluoromethane (CF3I), also known as trifluoroiodomethane, is a gas which has a very low GWP and serves a number of purposes, including use as a PFC substitute gas for manufacturing semiconductors and liquid crystals. High purity CF3I can be use as a dry etching gas in semiconductor industry.
CF3I has been used as a plasma dry etching gas for manufacturing semiconductors. In the process of manufacturing semiconductors compatible with 32-45nm-generation process technology, it was discovered that the use of CF3I resulted in a reduction of line edge roughness and an improvement in wiring reliability compared to products manufactured with conventional alternatives. It was also demonstrated that the use of CF3I combined with exposure to short wavelength extreme ultraviolet (EUV) light in the etching process is effective for manufacturing semiconductors compatible with next-generation 22 nm chip technology. CF3I Suppresses roughness of a surface and sidewall of the ArF photoresist.
For more, email us [email protected].

CF3I, refrigerant component in replacement for HCFCs & HFCsCF3I, as a refrigerant component, can form new refrigerants t...
11/09/2019

CF3I, refrigerant component in replacement for HCFCs & HFCs

CF3I, as a refrigerant component, can form new refrigerants to replace HFCs with high GWP. Honeywell announced R466A to replace a potential non-flammable, lower GWP replacement for R410A, which caused considerable global interest. The blend proportions are 39.5% CF3I, 49% R32 and 11.5% R125. The main reason for R466A non-flammability & low GWP is CF3I. As a fire suppressant, CF3I is thought to be considered as a replacement for halon 1301. CF3I makes up 39.5% of the new blend but its 100-year GWP is less than 1[3]. Toshiba Carrier is said to have described R-466A as “promising” after initial performance testing in a larger-charge VRF air conditioning system. Honeywell’s a new development refrigerant HDR-147, in a reversible heat pump system, is said to have GWP of around 400.
Honeywell revealed the results of performance tests using R466A and HDR147 in a 3 ton R410A residential ducted split heat pump system. They can match the performance of R410A without significant system modification, showing more than 5% efficiency improvements at higher ambient temperatures compared to R410A

CF3I,a plasma dry etching gas for 3D NAND Flash.In the 32-45nm-generation process technology: CF3I resulted in a reducti...
11/09/2019

CF3I,a plasma dry etching gas for 3D NAND Flash.

In the 32-45nm-generation process technology: CF3I resulted in a reduction of line edge roughness and an improvement in wiring reliability compared to products manufactured with conventional alternatives.
The use of CF3I combined with exposure to short wavelength extreme ultraviolet (EUV) light in the etching process is effective for manufacturing semiconductors compatible with 22 nm chip technology

CF3I, also called Iodotrifluoromethane, has near zero ozone depletion potential(ODP), low global warming potential (GWP)...
11/09/2019

CF3I, also called Iodotrifluoromethane, has near zero ozone depletion potential(ODP), low global warming potential (GWP) and non-flammable properties, which has wide applications in different fields. As a fire suppressant, CF3I has been considered as a replacement for halon 1301 in unoccupied areas. As a refrigerant component, its blends can form refrigerants in replacements for CFCs, HCFCs as well as HFCs, especially Honeywell’s announcement of new products R-466A & HDR-147, alternatives for R410A. As an etching gas, CF3I has been applied in the production of semiconductor chips. As an electrical Insulation gas, CF3I and its gas mixtures has been considered as an alternative to SF6 in electric equipment. CF3I can also be used as pharmaceutical intermediate to provide trifluoromethylation source. It is also thought to be a cover gas for magnesium die casting, a potential medical propellant and a seriously good foam blowing agent.

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