Raith Group

03/09/2026

The RAITH Micrograph Award 2026 is now open for submissions!

Each year, researchers around the world create remarkable nanostructures, devices, and experiments using RAITH systems. The Micrograph Award is an opportunity to showcase that work and the science behind it.

Submit 1-3 SEM images produced with a RAITH system or lithography attachment, along with a brief description of what they show. Unlike many image competitions, submissions are judged primarily on the work behind the image:
• Uniqueness of the nanostructure
• Technical quality of the micrograph
• Quality of the description

The winning entry receives a fully sponsored trip to a nano-related conference of choice, including registration and travel arrangements. Additional prizes of €400 and €200 will be awarded to the second and third place entries.

Submission deadline: October 30, 2026

We look forward to seeing the nanostructures, devices, and research achievements created by the RAITH community.

Learn more and submit your entry: https://raith.com/company/micrograph-award/?utm_source=meta&utm_medium=organic-social&utm_campaign=micrograph-award-26

02/09/2026

The future of photonics and semiconductor integration is being built at the nanoscale.
At SEMICON Taiwan, RAITH will showcase nanofabrication solutions supporting the development of next-generation:
• DFB lasers for optical communication
• Metalenses and advanced photonic components
• Optical waveguides
• Advanced semiconductor packaging

As photonic and electronic functionalities converge, precise and flexible nanofabrication becomes increasingly critical. From research and rapid prototyping to process development and technology transfer, RAITH's lithography and process control solutions enable researchers and engineers to translate innovative device concepts into functional reality.

If you are attending SEMICON Taiwan, visit us at booth to discuss the fabrication challenges behind tomorrow's photonic and semiconductor technologies.

27/08/2026

Find us at the Advanced Semiconductor Packaging and Chiplet Show (ASPS) in Korea this week. Come by our booth and discuss how how RAITH technologies support innovation across semiconductor research and manufacturing workflows, from lithography through imaging and analysis. Whether developing next-generation devices, advanced packaging concepts, or novel materials, researchers and engineers rely on high-resolution patterning and characterization tools to gain deeper process insight and accelerate development.

Visit RAITH at ASPS to learn how our solutions enable:
• Nanofabrication and lithography for semiconductor R&D
• High-resolution imaging and analysis of structures and devices
• Process development for advanced semiconductor applications

We look forward to connecting with the semiconductor community in South Korea.

20/08/2026

We are currently attending the nanoFab UK 2026. Come by our booth if you are there and don't miss the talk "Direct Write Lithography with Electron, Ion and Laser Beams - Applications and Technology" by our colleague Andreas Remscheid tomorrow at 10:15 in the Jeremy Bentham Room, Wilkins Building, University College London.

12/08/2026

Join us for the annual RAITH User Dinner at this year’s MNE.

On September 20, the evening before MNE 2026 begins, RAITH Users and RAITH Experts will come together for an informal dinner at Harder Kulm in Interlaken, Switzerland. The event brings together members of the RAITH community to exchange experiences, discuss current challenges and applications, and connect with fellow researchers in nanofabrication and microscopy.

We look forward to an evening of insightful conversations and networking in a unique setting overlooking Interlaken.

Get more information and save your seat here: https://bit.ly/4wI8jTH

06/08/2026

Our E-LINE customers at Ludwig-Maximilians-University Munich published a groundbreaking study in Nature demonstrating ultrafast radiative-loss tuning in metasurfaces through temporal symmetry breaking.

Using electron beam lithography, the team fabricated silicon nanoresonators designed to achieve restored symmetry-protected bound states in the continuum (RSP-BICs). Selective Mie-resonant optical pumping enabled dynamic creation and annihilation of resonances with high Q-factors, allowing on/off switching at sub-picosecond speeds. This unprecedented level of control opens new possibilities for low-loss, all-optical switching for telecommunications or computing and time-resolved enhanced light–matter interactions. Read the full article here:

The ultrafast optical control of resonances in temporally symmetry-broken metasurfaces allows resonances to be created, annihilated or programmably manipulated, which is useful for applications that require active real-time tunability.

30/07/2026

The best ideas in nanofabrication are often exchanged between sessions, not during them.

The RAITH Expert Workshop and Skill Days are designed to create exactly these conversations. And for the first time, they are coming to the Americas.

Whether you work with an EBPG, PICOMASTER, VELION, or other RAITH systems, the workshops provide a forum to discuss applications, share experiences, explore new workflows, and connect directly with RAITH experts and fellow users.

Join us this November at:

• Pennsylvania State University (Nov 2-3)
• University of California, Santa Barbara (Nov 5-6)

We look forward to advancing nanofabrication knowledge together.

Learn more and register: http://bit.ly/45AwyHW

29/07/2026

As semiconductor devices scale in complexity, failure analysis increasingly depends on more than high-resolution imaging alone.

In a newly published article, Peter Gnauck, Alexander Ost, and Torsten Richter present an automated hyperspectral SIMS approach that combines nanoscale spatial resolution, high chemical sensitivity, and automated defect localization.
The paper shows how complete mass spectra acquired at every image pixel can reveal buried contamination, isotopic distributions, and material variations that are difficult to detect using conventional methods. Automated navigation based on GDSII layouts and KLARF inspection data further streamlines the path from defect detection to chemical characterization.

Examples include sodium contamination analysis within buried vias and 3D chemical reconstruction of critical device features, demonstrating new possibilities for semiconductor failure analysis and process characterization.

Read the whole article here: https://srcpublishers.com/biosensors-and-bioelectronics-re/article/view/7831/8163

16/07/2026

From rapid prototyping to reliable microfabrication workflows, laser lithography has become an essential tool across multiple domains of micro- and nanotechnology.

We recently sold the 250th laser lithography system and are very proud to mark an important step in this ongoing journey.

By enabling maskless patterning, high alignment accuracy, and efficient design iteration RAITH laser systems support a wide range of applications, from holography to MEMS, photonics and much more. This flexibility allows researchers and engineers to move quickly from concept to functional structures.

We thank our global community of users for their trust as well as our colleagues for continuously expanding the limits of what laser lithography can achieve.

Discover our laser lithography systems and how they are used across applications:
https://raith.com/products/laser-lithography/?utm_source=facebook&utm_medium=organic-social&utm_campaign=250-lbl

06/07/2026

Last week marked the installation and inauguration of an E LINE system at the RheinMain University of Applied Sciences. It is an integral part of the MINIMISE research project focusing on the development of novel sensors for hydrogen and infrared detection. The E-LINE will enable them to integrate nanostructures directly into MEMS.

Developments in MEMS research are demonstrating how sub 10 nm structures are no longer confined to test environments, but are being directly integrated into functional sensor architectures. Bringing these two aspects together highlights a key requirement in modern nanofabrication: the ability to reliably combine ultra fine features with larger device geometries within a single, consistent workflow.

E LINE addresses this challenge as a multifunctional electron beam lithography platform:
- Patterning with single digit nanometer resolution
- Efficient integration of nano and microscale structures
- In situ imaging, analysis, and processing capabilities
- Flexibility for advanced MEMS and NEMS research and prototyping

With this installation, researchers gain a system designed to translate nanoscale precision into functional device performance. For further insight into recent progress in MEMS integration, see the full article (German only):

(Bild: Hochschule RheinMain) Mikrosysteme (MEMS) sind das Rückgrat der Prozessmesstechnik. Doch die Anforderungen, getrieben durch die Energiewende, reicht die Mikrometer-Skala oft nicht aus. Wissenschaftler der Hochschule RheinMain (HSRM) haben nun eine Technologieplattform vorgestellt, die Nanost...